| 发明名称 |
Compound for photoacid generator, resist composition using the same, and pattern-forming method |
| 摘要 |
<p>An onium sulfonate salt represented by the formula (1) below can be used as an excellent radiation-sensitive acid generator for resist compositions. A good pattern can be formed by using a resist composition containing the onium sulfonate salt.[chemical formula 64]In the formula (1), R1 represents a monovalent organic group, and Q+ represents a sulfonium cation or an iodonium cation.</p> |
| 申请公布号 |
KR20090110935(A) |
申请公布日期 |
2009.10.23 |
| 申请号 |
KR20097018822 |
申请日期 |
2008.02.14 |
| 申请人 |
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发明人 |
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| 分类号 |
C07C309/27;C07C381/12;C08F20/24;G03F7/004 |
主分类号 |
C07C309/27 |
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代理人 |
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| 主权项 |
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| 地址 |
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