| 摘要 |
<P>PROBLEM TO BE SOLVED: To dispose a controller physically near an actuator of an optical device in a lithographic device without significantly changing the specification of the controller. <P>SOLUTION: The lithographic device includes a lighting system adjusting radiation beams and a support supporting a patterning device. The patterning device patterns the sectional surface of the radiation beam to form the patterned radiation beam. A substrate table supports the substrate and a projection system projects the patterned radiation beam onto a target part of the substrate. The projection system includes a vacuum chamber and the controller controlling the actuator of the optical device disposed in the vacuum chamber. The vacuum chamber 1 includes an air-tight sealed type housing 4 housing the controller 5. The housing 4 includes an electric connecting part 6 for electrically connecting the controller 5 to the optical device 9 and is connected to an outer wall 2 of the vacuum chamber 1 via a fluid cooling passage 16 cooling the controller 5. <P>COPYRIGHT: (C)2010,JPO&INPIT |
