| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive colored composition that minimizes exposure illuminance dependence (in particular, shape irregularities of line width or the like at low illuminance of ≤95% of high illuminance), has high normalized remaining film thickness and little development residue and can stably form a pattern excellent in resolution, to provide a color filter which permits precise and high-quality image display, and to provide a method of manufacturing the color filter. <P>SOLUTION: The photosensitive colored composition includes a dye, a polymerizable monomer, an alkali-soluble resin, a photopolymerization initiator and a compound represented by general formula (I). In the general formula (I), R<SP>1</SP>and R<SP>2</SP>respectively and independently present a hydrogen atom, a 1-20C alkyl group or a 6-20C allyl group, R<SP>1</SP>and R<SP>2</SP>may be equal to each other or different from each other and do not present hydrogen atom at the same time, R<SP>1</SP>and R<SP>2</SP>may form a cyclic amino group together with nitrogen atom and R<SP>3</SP>and R<SP>4</SP>present an electron-absorbing group, respectively and independently. <P>COPYRIGHT: (C)2010,JPO&INPIT |
