| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition and a method of forming a resist pattern, capable of forming a resist pattern having a satisfactory shape, and exhibiting excellent lithographic characteristics. <P>SOLUTION: The resist composition includes a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid, and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1): X-Q<SP>1</SP>-Y<SP>1</SP>-SO<SB>3</SB><SP>-</SP>A<SP>+</SP>(wherein Q<SP>1</SP>represents a divalent linkage group containing an oxygen atom; Y<SP>1</SP>represents a 1-4C fluorinated alkylene group which may have a substituent, with the proviso that the carbon atom adjacent to the sulfur atom within the -SO<SB>3</SB><SP>-</SP>group has a fluorine atom bonded thereto; X represents a 3-30C hydrocarbon group which may have a substituent; and A<SP>+</SP>represents an organic cation). The resist composition further includes an organic compound (C) which generates an acid exhibiting a weaker acid strength than the acid generated from the acid generator (B1) upon exposure. <P>COPYRIGHT: (C)2010,JPO&INPIT |
