| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus in which an impedance matching state is maintained, without being changed by a large amount, even if a substrate holder is moved. Ž<P>SOLUTION: This substrate processing apparatus comprises a processing chamber; a substrate holder disposed in the chamber for holding a substrate; a high-frequency power source for supplying a high-frequency power to the substrate holder; a matching box, electrically located in between the substrate holder and the high-frequency power source; and a movement mechanism for making g the substrate holder and the matching box move integrally. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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