| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a carboxylate derivative comprising a sulfamoyl group useful as a synthetic intermediate of a monomer for a polymer compound for use in a photoresist composition. Ž<P>SOLUTION: The carboxylate derivative comprising a sulfamoyl group is represented by formula (in the formula, R<SP>1</SP>and R<SP>2</SP>each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, an alkylene group that may contain an oxygen atom or a sulfur atom on an optional position with R<SP>1</SP>and R<SP>2</SP>bound together, -O- or -S-; R<SP>3</SP>represents a hydrogen atom or an alkyl group; R<SP>4</SP>and R<SP>5</SP>each independently represents a hydrogen atom, an alkyl group that may contain an oxygen atom on an optional position, a cycloalkyl group that may contain an oxygen atom on an optional position or an alkoxycarbonyl group that may contain an oxygen atom on an optional position). Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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