| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photosensitive composition which is excellent in line edge roughness and exposure latitude, and to provide a pattern formation method using the positive photosensitive composition. <P>SOLUTION: The positive photosensitive composition contains: a resin (A) which includes a recurring unit containing a lactone structure and a recurring specific structural unit having a Van der Waals volume of 306×10<SP>-30</SP>m<SP>3</SP>or less, and facilitates dissolution to alkali by the action of acid; and a compound (B) which produces alkane sulfonic acid substituted with fluorine having a Van der Waals volume less than 135×10<SP>-30</SP>m<SP>3</SP>by the irradiation of active light rays or radiation. The pattern formation method uses the positive photosensitive composition. <P>COPYRIGHT: (C)2010,JPO&INPIT |
