发明名称 APPARATUS FOR HEATING A SUBSTRATE AND METHOD FOR MANUFACTURING THE APPARATUS
摘要 PURPOSE: An apparatus for heating a substrate and a method for manufacturing the apparatus are provided to heat a substrate to high temperature with small power and reduce time for heating a substrate. CONSTITUTION: A substrate heating apparatus(100) includes a metal body(110) and a metal nitride layer(140). A heating body(120) is embedded in the metal body. The metal body supports a substrate(10). The metal nitride layer is on a surface of the metal body. Thickness of the metal nitride layer is equal to or thicker than thickness of areas except an area where substrates are placed.
申请公布号 KR20090110394(A) 申请公布日期 2009.10.22
申请号 KR20080035858 申请日期 2008.04.18
申请人 KOMICO LTD. 发明人 CHOI, JIN SIK;CHO, SANG BUM
分类号 H01L21/683;H01L23/34 主分类号 H01L21/683
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