Method for preparing a polymer film having nanometric patterns on its surface and a microstructure in its thickness on all or part thereof according to a specific system

摘要

The process of preparing a polymer film (23) having surface with nano-metric and microstructured patterns (27, 29) on entire or part of its thickness according to a particular system, comprises selecting a block copolymer for microstructuring at a temperature according to the particular system and a predetermined thickness, selecting a mold (25) with the predetermined thickness and the nanometric patterns, and applying the mold on a film by heating at a predetermined temperature to obtains the polymer film. The system is a lamellar system, cylindrical or a spherical system. The process of preparing a polymer film (23) having surface with nano-metric and microstructured patterns (27, 29) on entire or part of its thickness according to a particular system, comprises selecting a block copolymer for microstructuring at a temperature according to the particular system and a predetermined thickness, selecting a mold (25) with the predetermined thickness and the nanometric patterns, and applying the mold on a film by heating at a predetermined temperature to obtains the polymer film. The system is a lamellar system, cylindrical or a spherical system, or a micellar system. The mold is sized so that the film obtained after application of the mold does not have grain boundary.