发明名称 Semiconductor device
摘要 A semiconductor device comprises a semiconductor substrate, a plurality of transistors provided in the semiconductor substrate, and an isolation region for isolating the plurality of transistors to one another, the isolation region being comprised of an isolating insulation film, wherein a crystal structure of at least a part of the isolating insulation film is broken.
申请公布号 US7605442(B2) 申请公布日期 2009.10.20
申请号 US20080263830 申请日期 2008.11.03
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 FUJII OSAMU;SANUKI TOMOYA
分类号 H01L21/762 主分类号 H01L21/762
代理机构 代理人
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