发明名称 COMPOSITION FOR FORMING AN INORGANIC MATERIAL PATTERN AND METHOD FOR FORMING A PATTERN OF INORGANIC MATERIAL USING THE SAME
摘要 <p>PURPOSE: A composition for forming inorganic pattern is provided to form inorganic pattern of nano or micro scale with low cost. CONSTITUTION: A composition for forming inorganic pattern comprises inorganic precursor, stabilizing agent, and solvent. The stabilizing agent is one or more selected fromβ-diketone andβ-keto ester. A method for producing reaction mixture solution (20) of inorganic precursor, stabilizing agent of inorganic precursor and solvent comprises: a step of patterning mixture solution by electrohydrodynamic lithography and a step of evaporating solvent to obtain inorganic pattern.</p>
申请公布号 KR20090108853(A) 申请公布日期 2009.10.19
申请号 KR20080034165 申请日期 2008.04.14
申请人 SAMSUNG ELECTRONICS CO., LTD.;SUNGKYUNKWAN UNIVERSITY FOUNDATION FOR CORPORATE COLLABORATION 发明人 CHA, SEUNG NAM;KANG, DAE JUN;SONG, BYONG GWON
分类号 G03F7/004 主分类号 G03F7/004
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