发明名称 |
COMPOSITION FOR FORMING AN INORGANIC MATERIAL PATTERN AND METHOD FOR FORMING A PATTERN OF INORGANIC MATERIAL USING THE SAME |
摘要 |
<p>PURPOSE: A composition for forming inorganic pattern is provided to form inorganic pattern of nano or micro scale with low cost. CONSTITUTION: A composition for forming inorganic pattern comprises inorganic precursor, stabilizing agent, and solvent. The stabilizing agent is one or more selected fromβ-diketone andβ-keto ester. A method for producing reaction mixture solution (20) of inorganic precursor, stabilizing agent of inorganic precursor and solvent comprises: a step of patterning mixture solution by electrohydrodynamic lithography and a step of evaporating solvent to obtain inorganic pattern.</p> |
申请公布号 |
KR20090108853(A) |
申请公布日期 |
2009.10.19 |
申请号 |
KR20080034165 |
申请日期 |
2008.04.14 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD.;SUNGKYUNKWAN UNIVERSITY FOUNDATION FOR CORPORATE COLLABORATION |
发明人 |
CHA, SEUNG NAM;KANG, DAE JUN;SONG, BYONG GWON |
分类号 |
G03F7/004 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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