| 摘要 |
[PROBLEMS] To eliminate abnormal discharge onto an inner surface of an ejection port on a ground electrode of a plasma processing apparatus. [MEANS FOR SOLVING PROBLEMS] A dielectric member (60) is arranged on a discharge surface (42), which is of a ground electrode (40) of a plasma processing apparatus and facing an electric field applying electrode (30). On the dielectric member (60), an ejection guide hole (62) continuous to a discharge space (1p) between the electrodes is formed, and on the ground electrode (40), an ejection port (41) continuous to the ejection guide hole (62) is formed. An inner surface of the ejection guide hole (62) on the dielectric member (60) is protruded from an inner surface of the ejection port (41) on the ground electrode (40). On the dielectric member (60), a step surface (64) is extended as the same surface from an abutting surface (63) which abuts to the ground electrode (40).
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