| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a vapor deposition system capable of reducing defects of a vapor-deposited film. Ž<P>SOLUTION: The vapor deposition system 1 for executing the vapor deposition of a material for vapor deposition on a substrate 11 is provided with: a crucible 21 for storing the material for vapor deposition; a heating means 30 for heating the crucible 21; and a charging member 40 which charges the splash to be possibly generated from the material for vapor deposition having low purity in the crucible 21, and is provided in a vicinity of an opening part 29 of the crucible 21 and charged in order to capture the splash before it reaches the substrate 11. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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