| 摘要 |
PROBLEM TO BE SOLVED: To provide a surface inspection device enabling surface inspection without depending on the direction of a pattern. SOLUTION: This surface inspection device 1 includes an illumination system 30 which emits circular polarization of light onto the surface 10a of a wafer 10 having a predetermined repeat pattern, an analyzer 51 which extracts a polarization component being approximately orthogonal to the circular polarization of light of regular reflection light from the wafer 10 onto which the circular polarization of light is emitted, a two-dimensional imaging element 56 which detects the surface image of the wafer 10 obtained from the polarization component extracted by the analyzer 51, and a signal processing unit 60 which inspects abnormality in the repeat pattern based on light intensity distribution of the surface image of the wafer 10 detected by the two-dimensional imaging element 56. COPYRIGHT: (C)2010,JPO&INPIT
|
