| 摘要 |
<p>An inspection device (1) includes: an illumination optical system (10) which applies an illumination light onto a surface of a wafer (W); a detection optical system (20) for observing the surface of the wafer (W) illuminated by the illumination light in an enlarged scale; detection elements (36a, 36b, 36c) for detecting luminance of reflected light from the wafer (W) on a pupil surface in the inspection optical system (20); a CPU (43) which inspects the surface of the wafer (W) in accordance with the luminance detected by the detection elements (36a, 36b, 36c); and a scan unit (60) which scans the range of the wafer (W) corresponding to the pupil surface on which the luminance is detected.</p> |
