| 发明名称 |
PROCESS AND APPARATUS FOR PREPARING SUPERCONDUCTING THIN FILMS |
| 摘要 |
A process for preparing a thin film of high-temperature compound oxide superconductor on a substrate by magnetron sputtering method. A substrate and a target are arranged in parallel with each other in a vacuum chamber and one of the substrate and the target is moved relatively and in parallel with another during the thin film is formed by sputtering.
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| 申请公布号 |
CA2045267(C) |
申请公布日期 |
1998.12.08 |
| 申请号 |
CA19912045267 |
申请日期 |
1991.06.21 |
| 申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD. |
发明人 |
ITOZAKI, HIDEO;HATTORI, HSIAO;HARADA, KEIZO;HIGAKI, KENJIRO |
| 分类号 |
H01L39/24;(IPC1-7):C23C14/35;C23C14/08 |
主分类号 |
H01L39/24 |
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