发明名称 |
IMPROVED DOSE UNIFORMITY DURING SCANNED ION IMPLANTATION |
摘要 |
The present invention is directed to implanting ions in a workpiece in a serial implantation process in a manner that produces one or more scan patterns on the workpiece that resemble the size, shape and/or other dimensional aspects of the workpiece. Further, the scan patterns are interleaved with one another and can continue to be produced until the entirety of the workpiece is uniformly implanted with ions. |
申请公布号 |
WO2006055379(A3) |
申请公布日期 |
2007.10.04 |
申请号 |
WO2005US40692 |
申请日期 |
2005.11.08 |
申请人 |
AXCELIS TECHNOLOGIES, INC.;GRAF, MICHAEL;RAY, ANDY |
发明人 |
GRAF, MICHAEL;RAY, ANDY |
分类号 |
H01J37/317;H01J37/20;H01J37/302;H01J37/304;H01L21/68 |
主分类号 |
H01J37/317 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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