发明名称 Method and Apparatus for Inspecting Defects
摘要 A two-dimensional sensor is installed inclining at a predetermined angle to a moving direction of a stage on which an object to be inspected is mounted and, in synchronism with the movement of the stage, a picked up image is rearranged so that there can be obtained an image in high-density sampling with a picture-element size or less of the two-dimensional sensor with respect to a wafer. Thus, interpolation calculation during position alignment becomes unnecessary, and size calculation and classification of a defect can be performed with high accuracy.
申请公布号 US2009257647(A1) 申请公布日期 2009.10.15
申请号 US20090420932 申请日期 2009.04.09
申请人 YOSHITAKE YASUHIRO;NAKANO HIROYUKI;SHIBATA YUKIHIRO 发明人 YOSHITAKE YASUHIRO;NAKANO HIROYUKI;SHIBATA YUKIHIRO
分类号 G06K9/00;G01N21/956;H01L21/66;H04N5/335 主分类号 G06K9/00
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