| 摘要 |
PROBLEM TO BE SOLVED: To provide a deposition method in which a loss of materials is reduced to achieve a utilization efficiency and a thin film of fine patterns can be formed on a deposition substrate, to provide a light-emitting element formed using the deposition method and to provide a method of manufacturing a high definition light-emitting device at a low cost. SOLUTION: A material contained in a material layer is deposited selectively on the deposition substrate which is arranged to face the material layer, by irradiating light on a light absorbing layer after transmitting the substrate on a deposition substrate in which the light absorbing layer and the material layer are formed on a substrate. By forming selectively the light absorbing layer, a film deposited on the deposition substrate can get selectively a deposition of fine patterns reflecting patterns of the light absorbing layer. For formation of the material layer, powder containing an organic compound material is dispersed on the substrate and the light absorbing layer and is solidified by a heat treatment. COPYRIGHT: (C)2010,JPO&INPIT
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