发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 An substrate processing apparatus includes a substrate holding unit, a process liquid supplying unit, a first guide portion provided around the substrate holding unit for guiding the process liquid scattered from the substrate, a second guide portion provided outside the first guide portion for guiding the process liquid scattered from the substrate, a third guide portion provided outside the second guide portion for guiding the process liquid scattered from the substrate, a first recovery channel provided outside the first guide portion integrally with the first guide portion for recovering the process liquid guided by the second guide portion, a second recovery channel provided outside the first recovery channel integrally with the first guide portion for recovering the process liquid guided by the third guide portion, and a driving mechanism for independently moving up and down the first, second, and third guide portions.
申请公布号 KR100921601(B1) 申请公布日期 2009.10.14
申请号 KR20070097290 申请日期 2007.09.27
申请人 发明人
分类号 H01L21/02;B08B3/02;G02F1/13;G02F1/1333;G03F1/82;H01L21/00;H01L21/027;H01L21/304;H01L21/306 主分类号 H01L21/02
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