| 摘要 |
PURPOSE: A structure for sealing a plasma processing apparatus is provided to prevent physical or electrical damage to a substrate due to an abnormal discharge. CONSTITUTION: A structure for sealing a plasma processing apparatus includes a first sealing member(11) of a ring shape, a second sealing member(12) of a ring shape, a gap(S), a gas injection hole, and a groove(13). The first sealing member is contacted in a plasma atmosphere of a plasma generating room. The second sealing member is not contacted in a plasma atmosphere of a plasma generating room. The gap is formed between the first sealing member and the second sealing member. The gas injection hole injects an inert gas to the gap. The groove is formed in a surface bonded in the first sealing member, and connects the plasma generating room to the gap.
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