发明名称 Method of manufacturing image sensor
摘要 Provided is a method of manufacturing an image sensor. A microlens of inorganic material can be formed on a substrate by forming a seed microlens having a top surface with height differences, and then blanket etching the seed microlens to form a dome shaped microlens having a curvature following the height differences of the seed microlens. The height differences in the top surface of the seed microlens can be created by implanting nitrogen at different depths into an inorganic layer to form ion implantation regions, and removing the ion implantation regions from the inorganic layer.
申请公布号 US7601557(B2) 申请公布日期 2009.10.13
申请号 US20080137612 申请日期 2008.06.12
申请人 DONGBU HITEK CO., LTD. 发明人 BAEK IN CHEOL
分类号 H01L21/20 主分类号 H01L21/20
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