发明名称 |
Reference data generating method, pattern defect checking apparatus, pattern defect checking method, reference data generating program, and semiconductor device manufacturing method |
摘要 |
A method of generating reference data is disclosed, in which two-value or multi-value gradated data of pixels is obtained in units of pixels from a design data of a pattern to be formed on an object, a processed data is obtained by carrying out calculations to the gradated data, and a reference data for use in a comparison with a sensed data obtained by image-picking up a pattern formed on the object is obtained based on the processed data, the method comprising carrying out a first calculation including a predetermined parameter to a value of an gradated data of a targeted pixel among the pixels to obtain a first processed data, and carrying out a second calculation including a predetermined parameter to the values of the gradated data of the targeted pixel and pixels located at the periphery of the targeted pixel to obtain a second processed data.
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申请公布号 |
US7602961(B2) |
申请公布日期 |
2009.10.13 |
申请号 |
US20040024198 |
申请日期 |
2004.12.29 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
YOSHIKAWA RYOJI;WATANABE HIDEHIRO |
分类号 |
G01B11/30;G06K9/00;G01B11/24;G01N21/956;G03F1/00;G06T1/00;G06T5/00;G06T5/50;G06T7/00 |
主分类号 |
G01B11/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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