发明名称 Method for selecting optical configuration for high-precision scatterometric measurement
摘要 The present application discloses a method for selecting an optical configuration for a high-precision scatterometric measurement. A geometric parameterization of a grating is determined, wherein the grating comprises a periodic structure. The geometric parameterization is used to generate a representative set of model structures. An eigenvalue method is utilized to compute, for each model structure, a set of solutions which satisfy a Rayleigh condition within the grating. The Raleigh condition within the grating is satisfied when a vertical component of a propagating mode within the grating is zero. Other embodiments, features and aspects are also disclosed herein.
申请公布号 US7602509(B1) 申请公布日期 2009.10.13
申请号 US20080077335 申请日期 2008.03.18
申请人 KLA-TENCOR CORPORATION 发明人 HENCH JOHN J.
分类号 G01B11/14 主分类号 G01B11/14
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