发明名称 |
A method of assessing a model, an inspection apparatus and a lithographic apparatus. |
摘要 |
A method of assessing a model of a substrate is presented. A scatterometry measurement is taken using radiation at a first wavelength. The wavelength of the radiation is then changed and a further scatterometry measurement taken. If the scatterometry measurements are consistent across a range of wavelengths then the model is sufficiently accurate. However, if the scatterometry measurements change as the wavelength changes then the model of the substrate is not sufficiently accurate. |
申请公布号 |
NL1036734(A1) |
申请公布日期 |
2009.10.12 |
申请号 |
NL20091036734 |
申请日期 |
2009.03.19 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
ARIE JEFFREY DEN BOEF;HUGO AUGUSTINUS JOSEPH CRAMER;MARCUS ADRIANUS VAN DE KERKHOF;HENRICUS PETRUS MARIA PELLEMANS;MARTIN EBERT |
分类号 |
G03F7/20;G01N21/47;H01L21/66 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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