发明名称 NEGATIVE RESIST COMPOSITION
摘要 PURPOSE: A negative resist composition is provided to minimize liquid crystal contamination because the composition is not nearly decomposed and to ensure excellent heat resistance at high temperature and moisture absorption resistance. CONSTITUTION: A negative resist composition comprises a binder resin, poly(meth) acrylic monomer, photoinitiator and organic solvent. The binder resin is represented by chemical formula 1. The average molecular weight of the binder resin is 1,000 ~ 300,000. The dispersion degree of the binder resin is 1.0 ~ 10.0. In chemical formula 1, A is a polymerization unit formed from a (meth) acrylic acid ester monomer substituted with C3-10 epoxy group; B is a polymerization unit formed from a maleamic acid monomer.
申请公布号 KR20090106846(A) 申请公布日期 2009.10.12
申请号 KR20080032229 申请日期 2008.04.07
申请人 SAMYANGEMS CO., LTD. 发明人 MOON, BONG SEOK;KIM, HYO JEONG;KIM, JIN GON;YANG, PIL RYE;JEON, JI HYEON;LEE, DONG HWAN;LEE, HYU JI;JUNG, NAK CHIL;KIM, SEON HO
分类号 G03F7/027;G03F7/028 主分类号 G03F7/027
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