| 摘要 |
PURPOSE: An etching apparatus is provided to reduce a size of a droplet particle fined by ultrasonic or megasonic by increasing spray pressure of solution through a pneumatic pressure part. CONSTITUTION: An etching apparatus(100) includes an etching solution supply part(101), an etching bath(103), an ultrasonic or megasonic oscillator(104), a spray nozzle(106), and a pneumatic pressure part(102a,102b). The etching solution supply part supplies an etching solution(105). The etching bath stores the etching solution supplied by the etching solution supply part. The ultrasonic or megasonic oscillator mixes the etching solution inside the etching bath. The spray nozzle sprays the etching solution to outside. The pneumatic pressure part is formed in an opposite side of the spray nozzle.
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