| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of eliminating variation in quality of substrate process, irrespective of the time in the non-operational state of the apparatus during a predetermined manufacturing processing (lot processing or batch processing). <P>SOLUTION: The substrate processing apparatus has a control means for performing a first recipe to process the substrate; and performs a second recipe, to maintain a processing chamber for processing the substrate, when a predetermined period of time elapses, in a state in which the substrate is not fed for the sequential substrate process, after the first recipe is performed, to finalize the predetermined substrate processing. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
