| 摘要 |
Provided is a scanning arm which moves to collect pollutants on the surface of a semiconductor wafer, for use in a semiconductor wafer pollutant measurement apparatus, and a scanning device using the same the scanning arm includes: an X-axis portion; a Z-axis portion which is perpendicularly installed with the X-axis portion so as to move forward and backward along the X-axis portion; and a Y-axis portion which is perpendicularly installed with the Z-axis portion so as to move up and down with respect to the Z-axis portion. The scanning device includes: the scanning arm; and a scanning nozzle which is installed at the Y-axis portion, and inhales a scan solution from a reagent solution bottle to then discharge a reagent scan solution on the surface of a wafer which is located on a scan stage and simultaneously keep an inhalation condition and move along the surface of the wafer, to then inhale and keep the scan solution including pollutants sticked on the wafer surface. The X-axis portion, the Y-axis portion and the Z-axis portion includes a linear motion (LM) guide and a screw bar in an external casing, respectively, in which a slider is combined with the screw bar by a ball bushing combination so that the slider moves according to rotation of the screw bar. The scanning nozzle includes: a pumping portion; a support which supports the pumping portion; and a nozzle main body which is connected below the pumping portion. The scanning device for the semiconductor wafer pollutant measurement apparatus has a feature that collection and drying are simultaneously achieved by the scanning arm having a three-axis operational trace and a drier.
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