发明名称 SUPPORTING MECHANISM OF SUBSTANCE FOR FILM DEPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a supporting mechanism of a film deposition apparatus can reduce non-film-deposited portions in a substance for film deposition with a simple constitution. SOLUTION: A conveying tray 40 of a glass substrate W1 in a film deposition apparatus 1 for supporting the glass substrate W1 with its film deposition surface W1a being directed downwardly and adhering and depositing a substance for film deposition on the film deposition surface W1a is provided with a frame body 44 having an opening part 42 with the area equal to or more than that of the film deposition surface W1a therein and constituted of an outer frame 43 surrounding the opening part 42, and a plurality of wire-like linear supporting members 45, etc. which are projected inwardly from the outer frame 43 to support the glass substrate W1 at a plurality of parts and arranged so that the center of gravity G of the glass substrate W1 is located in a range R1 to be formed by connecting a plurality of parts. By supporting the glass substrate W1 by the wire-like linear supporting members 45, non-film-deposited portions of the glass substrate W1 are reduced. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009228050(A) 申请公布日期 2009.10.08
申请号 JP20080073975 申请日期 2008.03.21
申请人 SUMITOMO HEAVY IND LTD 发明人 MIYOSHI AKIRA;MURAKAMI YOSHINOBU
分类号 C23C14/24;H01L21/683 主分类号 C23C14/24
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