发明名称 Silica based positive type photosensitive organic compound
摘要 A material for a dielectric film used in a flat display or the like having a positive type photosensitivity containing: an ingredient (a): a siloxane resin soluble in aqueous alkaline solution obtained by hydrolysis-condensation of a compound represented by the following general formula (1): R1OCOASiX3 (1) (in which R1 and A each represent an organic group and X represents a hydrolyzable group), an ingredient (b): a dissolution inhibitory compound, an ingredient (c): an acid generator which is a compound generating an acid by the irradiation of a light or an electron beam, and an ingredient (d): a solvent capable of dissolving the ingredient (a), each of the ingredients including at least one member respectively in which the blending ratio of the ingredient (a) in the composition is from 5 to 50% by weight.
申请公布号 US2009251652(A1) 申请公布日期 2009.10.08
申请号 US20090379365 申请日期 2009.02.19
申请人 HITACHI CHEMICAL CO., LTD. 发明人 KOJIMA KYOKO;ABE KOICHI
分类号 G02F1/1333;G03F7/004;G03F7/20 主分类号 G02F1/1333
代理机构 代理人
主权项
地址
您可能感兴趣的专利