发明名称 HEAT TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a heat treatment apparatus making it possible to easily and excellently grasp the heat treatment state of a substrate using a flash lamp. SOLUTION: A measurement section 88 measures the energy of flash emitted by a light irradiating section 5 and guided by a light guide section 89, irrespective of whether a substrate W is held in a holding section 7. An approximate calculating section 93a obtains an approximate straight line by the least-square approximation of a measurement value E of the flash energy emitted at a plurality of times from the light irradiating section 5 to the substrate W side while a voltage applied to the flash lamp 69 is set constant. An energy calculating section 93b obtains a calculated value of the flash energy based on the approximate straight line. A decision section 93c determines the state of flash reaching the substrate W side, based on a calculated value of the flash energy calculated by the energy calculating section 93b and a measurement value of the flash energy measured by the measurement section 88 at the N2 time light emission. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009231703(A) 申请公布日期 2009.10.08
申请号 JP20080077697 申请日期 2008.03.25
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 KUROIWA TORU
分类号 H01L21/26 主分类号 H01L21/26
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