CHEMICAL VAPOUR DEPOSITION PROCESS

摘要

A thermal CVD process for growing carbon structures (e.g. CNT's) on a continuous substrate (1) that is moved into and out of a deposition chamber (5) through one or more non-airtight openings (13, 15) located at or near one end thereof, a reactive gas mixture being fed in from an opposing end (1). The substrate may reverse its direction inside the chamber and at least one reversing device (17) may be located at the opposing end. This process may form one stage of a semi-continuous or continuous process for manufacturing reinforcing composite fibres coated with carbon nanostructures.