| 摘要 |
<P>PROBLEM TO BE SOLVED: To reduce the apodization of a projection optical system pupil, and to decrease the aberration of a projection optical system. <P>SOLUTION: In the mask including a multilayer coating having a specified periodic film thickness distribution used in a lithographic apparatus, the periodic film thickness distribution in a mask plane is selected so as to be larger than the periodic film thickness distribution optimum for obtaining maximum reflectivity. Also, the periodic film thickness distribution is fixed over the entire mask surface. As a result, not only the symmetry of the apodization in a pupil increases, but also an change in intensity is reduced as a whole. <P>COPYRIGHT: (C)2010,JPO&INPIT |
