MULTI-BEAM EXPOSURE APPARATUS

摘要

<P>PROBLEM TO BE SOLVED: To improve a multi-beam exposure apparatus for scanning a plurality of beams. Ž<P>SOLUTION: This multi-beam exposure device 1 includes Σ(Ni-1) pieces of half mirrors 11 for combining ΣNi pieces of light into M pieces of light beam groups; M sets of finite lenses 8 for imparting positive power of a larger absolute value than the main scanning direction in the subscanning direction to be further converged in the subscanning direction; a combining reflecting mirror 13 for reflecting the M pieces of light beam groups so as to substantially overlap the first direction; a deflector 5 for deflecting the combined M pieces of light beam groups; and dustproof glass 14, inclined in the reverse direction of the inclining direction of the half mirrors, in a front stage of the deflector; and can reduce the influence of coma aberrations applied to the M pieces of light beam groups by the half mirrors. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž