发明名称 METHOD OF ALIGNING DEPOSITED NANOTUBES ONTO AN ETCHED FEATURE USING A SPACER
摘要 A method of forming an aligned connection between a nanotube layer and a raised feature is disclosed. A substrate having a raised feature has spacers formed next to the side of the raised feature. The spacers are etched until the sidewalls of the raised feature are exposed forming a notched feature at the top of the spacers. A patterned nanotube layer is formed such that the nanotube layer overlies the top of the spacer and contacts a side portion of the raised feature in the notched feature. The nanotube layer is then covered with an insulating layer. Then a top portion of the insulating layer is removed to expose a top portion of the etched feature.
申请公布号 US2009243102(A1) 申请公布日期 2009.10.01
申请号 US20090475013 申请日期 2009.05.29
申请人 NANTERO, INC. 发明人 YATES COLIN D.;NEVILLE CHRISTOPHER L.;RUECKES THOMAS;KONSEK STEVEN L.;MEINHOLD MITCHELL;BERTIN CLAUDE L.
分类号 H01L23/48;H01B5/00 主分类号 H01L23/48
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