发明名称 |
METHOD OF ALIGNING DEPOSITED NANOTUBES ONTO AN ETCHED FEATURE USING A SPACER |
摘要 |
A method of forming an aligned connection between a nanotube layer and a raised feature is disclosed. A substrate having a raised feature has spacers formed next to the side of the raised feature. The spacers are etched until the sidewalls of the raised feature are exposed forming a notched feature at the top of the spacers. A patterned nanotube layer is formed such that the nanotube layer overlies the top of the spacer and contacts a side portion of the raised feature in the notched feature. The nanotube layer is then covered with an insulating layer. Then a top portion of the insulating layer is removed to expose a top portion of the etched feature.
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申请公布号 |
US2009243102(A1) |
申请公布日期 |
2009.10.01 |
申请号 |
US20090475013 |
申请日期 |
2009.05.29 |
申请人 |
NANTERO, INC. |
发明人 |
YATES COLIN D.;NEVILLE CHRISTOPHER L.;RUECKES THOMAS;KONSEK STEVEN L.;MEINHOLD MITCHELL;BERTIN CLAUDE L. |
分类号 |
H01L23/48;H01B5/00 |
主分类号 |
H01L23/48 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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