发明名称 |
OXYGEN-CONTAINING PLASMA FLASH PROCESS FOR REDUCED MICRO-LOADING EFFECT AND CD BIAS |
摘要 |
A method for transferring a feature pattern to a thin film on a substrate using a hard mask layer is described. The method comprises exposing the substrate to an oxygen-containing flash process after the feature pattern is transferred to the hard mask layer and before the feature pattern is transferred to the thin film. |
申请公布号 |
US2009246713(A1) |
申请公布日期 |
2009.10.01 |
申请号 |
US20080058958 |
申请日期 |
2008.03.31 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
ZIN KELVIN;NISHINO MASARU |
分类号 |
G03F7/26 |
主分类号 |
G03F7/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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