| 摘要 |
<p>PURPOSE: An exposure mask and a method for forming a semiconductor device using the same are provided to stably form a cell pattern of a cell array region and a frame item of a scribe lane region. CONSTITUTION: An exposure mask includes a cell pattern and a light shielding pattern. The cell pattern is formed on a cell array region(A). The light shielding pattern is formed on a scribe lane region(B), and protects a frame item pattern formed on the scribe lane region. The frame item pattern includes one of an alignment key, a die fit target, an overlay vernier, a critical dimension bar, and a combination thereof. The exposure mask is applied to a negative type DPT(Double Patterning Technology).</p> |
