发明名称 |
DEVICE FOR APPLYING COMPRESSIVE RESIDUAL STRESS |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a device for applying compressive residual stress capable of reducing a stress to be applied to a peening non-object member adjacent to a peening object member. <P>SOLUTION: The device includes a peening device for applying a compressive residual stress to the peening object member by allowing jet jetted out from a jet nozzle in liquid to hit onto the peening object member in accompany with cavitation bubbles, and a cap 32 rocking in the covered state on the peening non-object member 33a adjacent to the peening object member. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
申请公布号 |
JP2009222522(A) |
申请公布日期 |
2009.10.01 |
申请号 |
JP20080066496 |
申请日期 |
2008.03.14 |
申请人 |
MITSUBISHI HEAVY IND LTD |
发明人 |
NEKOMOTO YOSHITSUGU;TOYODA MASAHIKO;SATO TOMONOBU;HIROTA KAZUO;OTA TAKAHIRO |
分类号 |
G21D1/00;B23K31/00;C21D7/06;G21C13/00;G21C17/10 |
主分类号 |
G21D1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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