发明名称 THIN FILM TRANSISTOR SUBSTRATE, DISPLAY DEVICE INCLUDING THE SAME, AND METHOD OF MANUFACTURING THE THIN FILM TRANSISTOR SUBSTRATE
摘要 <p>PURPOSE: A thin film transistor substrate, display device including the same, and method of manufacturing the thin film transistor substrate are provided to form a semiconductor substrate having small oxygen defect and good conductivity. CONSTITUTION: The thin film transistor substrate includes insulating plates(1,10), the gate electrode(2), the semiconductor layer(4), the gate insulating layer(3), and the source electrode(5) and drain electrode(6). The gate electrode is formed on the insulating plate. The semiconductor layer includes the metal oxide. The semiconductor layer has the 3%oxygen defect. The semiconductor layer is doped with h the concentration of 0.3 / cm^3 or 0.01 of 3d transition metal. The gate insulating layer is formed between the gate electrode and semiconductor layer. The source electrode and drain electrode are formed on the semiconductor layer.</p>
申请公布号 KR20090102521(A) 申请公布日期 2009.09.30
申请号 KR20080028016 申请日期 2008.03.26
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 YOON, KAP SOO;YANG, SUNG HOON;KIM, BYOUNG JUNE;LEE, CZANG HO;KIM, SUNG RYUL;OH, HWA YEUL;CHOI, JAE HO;CHOI, YONG MO
分类号 H01L29/786 主分类号 H01L29/786
代理机构 代理人
主权项
地址