发明名称 |
Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compound |
摘要 |
<p>An actinic ray-sensitive or radiation-sensitive resin composition and a pattern forming method using the composition are provided, the composition including (A) a resin containing a repeating unit having a group represented by formula (1) as defined in the specification, the resin being capable of increasing a solubility of the resin in an alkali developer by an action of an acid, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and a polymerizable compound represented by formula (M-1) as defined in the specification and polymer compound obtained by polymerizing the polymerizable compound are provided.</p> |
申请公布号 |
EP2105440(A2) |
申请公布日期 |
2009.09.30 |
申请号 |
EP20090156138 |
申请日期 |
2009.03.25 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
YAMAGUCHI, SHUHEI;YOSHIDA, YUKO;SHIBUYA, AKINORI;SHIRAKAWA, MICHIHIRO |
分类号 |
C07D311/94;C07C69/00;G03F7/004;G03F7/039 |
主分类号 |
C07D311/94 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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