发明名称 |
LITHOGRAPHIC APPARATUS, SUBSTRATE TABLE, AND METHOD FOR RELEASING A WAFER |
摘要 |
<p>A lithographic apparatus includes an illumination system constructed and arranged to condition a radiation beam, and a support constructed and arranged to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed and arranged to hold a substrate, and a projection system constructed and arranged to project the patterned radiation beam onto a target portion of the substrate. The substrate table includes a plurality of projections constructed and arranged to support corresponding parts of a bottom section of the substrate, and an actuator constructed and arranged to excite a Shockwave in the substrate.</p> |
申请公布号 |
KR20090101449(A) |
申请公布日期 |
2009.09.28 |
申请号 |
KR20097012830 |
申请日期 |
2007.12.18 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BLEEKER ARNO JAN;FRANKEN DOMINICUS JACOBUS PETRUS ADRIANUS;FRANSSEN JOHANNES HENDRIKUS GERTRUDIS;VAN DE VEN JOHANNES THEODORUS GUILLIELMUS MARIA;PUYT MICHIEL;DE WIT TEUN PETERUS ADRIANUS |
分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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