| 摘要 |
FIELD: physics. ^ SUBSTANCE: invention relates to generation of radiation in a given direction and required wavelength range. The method of generating radiation in a given direction in the required wavelength range involves generation of initial radiation using a radiation source and filtration of the initial radiation through controlled distribution of refraction index of beams in the control region. Filtration provides for selective deviation of beams of initial radiation depending on their wavelength and selection of beams with given wavelength. Control of distribution of refraction index of beams is achieved through controlling distribution of electron density in the control region. The device for generating radiation has a source of initial radiation and filtering apparatus. The filtering apparatus have apparatus for providing for controlled distribution of refraction index of beams. The latter, in their turn, have apparatus for controlling distribution of electron density in the control region. The lithography device contains the said device for generating radiation. ^ EFFECT: invention reduces probability of damage to filtration apparatus, while retaining the stream of radiation incident on them, and provides for generation of radiation at required wavelength. ^ 28 cl, 4 dwg |
