| 摘要 |
A liquid dish cleaning composition is disclosed, which comprises approximately by weight: (a) 1% to 6% of a sodium salt of a C8-C16 linear alkyl benzene sulfonated surfactant; (b) 7% to 13% of a magnesium salt of a C8-C16 linear alkyl benzene sulfonated surfactant; (c) 8% to 14% of an ammonium or sodium salt of an ethoxylated C8-C18 alkyl ether sulfate surfactant having 1 to 3 moles of ethylene oxide; (d) 8% to 14% of an ammonium or sodium salt of an ethoxylated C8-C18 alkyl ether sulphate surfactant having 5 to 10 moles of ethylene oxide; (e) 3% to 10% of an amine oxide .surfactant; (f) from 0 to 5% of a hydroxy containing organic acid; (g) from 0 to 10% of at least one solubilizing agent; and (h) water, wherein the composition has a pH of 3 to 7 and has a viscosity of 100 to 1,000 cps at 25 Deg. C using a #2 spindle at 20 rpm as measured on a Brookfield RVTDV-II viscometer; and wherein the cleaning composition does not include an alkali metal silicate or alkali metal builder.
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