发明名称 PROCESS FOR PRODUCING BICYCLOHEXYL
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for producing bicyclohexyl which is suitable as a liquid for immersion exposure having excellent transmittance at 193 nm by more reducing its absorbance. <P>SOLUTION: Disclosed is a method of producing bicyclohexyl having an average light transmittance at a wavelength of 193 nm of &ge;99.40% per 1 mm of the optical path length by bringing raw material bicyclohexyl into contact with an adsorbent, wherein the method comprises a step of bringing the raw material bicyclohexyl into contact with the adsorbent in an atmosphere of an inert gas having a purity of &ge;99.999 vol%, and after the step of bringing the bicyclohexyl as a raw material into contact with the adsorbent, installing a storage tank for temporarily storing the bicyclohexyl before it is filled into a container, and performing substitution with an inert gas in the storage tank. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009215265(A) 申请公布日期 2009.09.24
申请号 JP20080063284 申请日期 2008.03.12
申请人 JSR CORP 发明人 HIRANO SATORU;FURUKAWA TAIICHI
分类号 C07C7/12;C07C13/38;H01L21/027 主分类号 C07C7/12
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