EXPOSURE APPARATUS, EXPOSURE METHOD, CALCULATION METHOD, AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide an exposure apparatus for achieving excellent exposure performance with highly accurate calculation and compensation in variation of optical characteristics generated in a projection optical system.

SOLUTION: The exposure apparatus includes: a map acquiring section for acquiring pupil aberration map of the projection optical system; a distribution acquiring section for acquiring light intensity distribution formed on a pupil plane of the projection optical system when an optional reticle pattern is lighted in an optional lighting mode; a calculating section for calculating the saturation value of variations in optical characteristics generated in the projection optical system when the optional reticle pattern is lighted in the optional lighting mode, based on the pupil aberration map acquired by the map acquiring section and the light intensity distribution acquired by the distribution acquiring section; and an adjusting section for adjusting the projection optical system to reduce the amount of variation of optical characteristics in the projection optical system calculated from the saturation value of variations in optical characteristics generated in the projection optical system calculated by the calculating section.

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