| 摘要 |
<p>Disclosed is a process for producing a polymer, which comprises reacting a monomer in a solvent to produce a polymer solution, and contacting the polymer solution with a poor solvent to cause the precipitation of the polymer and remove impurities. In the process, the contact of the polymer solution with the poor solvent to cause the precipitation of the polymer is carried out after the polymer solution is diluted with a solvent by adding the solvent to the polymer solution. The solvent to be used for the polymerization preferably has a viscosity coefficient of 1 mPa s or more at 20°C. The solvent to be used for the dilution preferably has a viscosity coefficient of less than 1 mPa s at 20°C. The process enables the production of a polymer having less residual monomer and useful as a resist polymer, an under-layer film polymer or an anti-reflection film polymer for a multi-layered resist, or a polymer for an immersion topcoat with high efficiency and with good reproducibility of quality.</p> |
