| 摘要 |
Annealing apparatus (100) is provided with a chamber (2) for housing a wafer (W), heating sources (17a, 17b) which have a plurality of LEDs (33) irradiating the wafer (W) within the chamber (2) with light, a power source part (60) which feeds power to the LEDs (33) of the heating sources (17a, 17b), light transmission members (18a, 18b) which transmit light from the LEDs (33), an exhaustion mechanism which exhausts the inside of the chamber (2), a temperature calculation part (62) which calculates the temperature of the LEDs (33) on the basis of current-voltage properties in pn-junction of the LEDs (33) and those in the resistance of the LEDs, and an interlock part (63) which stops feeding of power by the power source part (60) when the temperature calculated by the temperature calculation part (62) exceeds a predetermined temperature. |
