| 摘要 |
PROBLEM TO BE SOLVED: To provide an inspection method wherein a non-inspection domain does not exist, capable of performing accurately defect inspection of an inspection object on which a repetitive pattern is formed, such as a liquid crystal panel, a plasma display or a semiconductor wafer. SOLUTION: In this inspection method of a substrate having a repetitive pattern, a comparison operation processing for comparing and operating each brightness on an attention pixel and a comparison pixel group separated as much as a representative repetitive pitch, and a comparison operation for comparing and operating each brightness on the attention pixel and a place separated from the representative repetitive pitch as much as a portion of the number of fine pixels, are performed in parallel. COPYRIGHT: (C)2009,JPO&INPIT
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