| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing cloth capable of attaining texture working of a hard disk substrate having less defect such as a scratch and texture trace with high sharp line density, having sufficient rubbing off of fine polishing waste and abrasive grain piece and sufficient cleaning property and capable of minimizing generation of scratch defect. <P>SOLUTION: The polishing cloth comprises an unwoven fabric obtained by entwining a polyamide ultrafine focusing fiber bundle having an average single fiber diameter of 0.05-2.0 μm and a polymer elastic body. In the sheet-like substance, in the bundle of the ultrafine focusing fiber, the polymer elastic body is not substantially present, a void of the entwined body of the ultrafine focusing fiber, the polymer elastic body is filled, and standing hair continued to the ultrafine focusing fiber is formed on one surface. The polishing cloth is made to a polishing cloth in which ultrafine single fiber diameter distribution, compression modulus of elasticity, twisting index and standing hair length satisfy specific conditions. <P>COPYRIGHT: (C)2009,JPO&INPIT |
